1. Study of Thin Silicon Oxides and High-K Materials for Gate Dielectrics in Metal-Insulator-Si Structures Open Access Author: Jiang, Jiayu Title: Study of Thin Silicon Oxides and High-K Materials for Gate Dielectrics in Metal-Insulator-Si Structures Graduate Program: Engineering Science and Mechanics Keywords: thin oxidehigh kgate dielectricscharacterization File: Download THESIS.pdf Committee Members: Osama O Awadelkarim, Committee Chair/Co-ChairS Ashok, Committee MemberMark William Horn, Committee MemberJerzy Ruzyllo, Committee MemberChristopher Roman Wronski, Committee Member
