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Start Over Year 2011 Keyword Tri-gate Keyword SiGe Keyword Fin nesting.

1. Strain engineering for strained p-channel Non-planar Tri-Gate field effect transistors

open_access

Open Access

Author:: Mujumdar, Salil Shashikant
Title:: Strain engineering for strained p-channel Non-planar Tri-Gate field effect transistors
Graduate Program:: Electrical Engineering
Keywords:: Si
Embedded S/D
Uniaxial strain
Tri-gate
P-channel
SiGe
Gate nesting
Mobility enhancements
Fin nesting.
File:: Download Thesis_Salil.pdf
Committee Members:: Suman Datta, Thesis Advisor/Co-Advisor
Suman Datta, Thesis Advisor/Co-Advisor