Low-Temperature Metalorganic Chemical Vapor Deposition of Electronic-Grade Molybdenum Disulfide on Multicomponent Glass Substrates
Open Access
- Author:
- Simonson, Nicholas
- Graduate Program:
- Materials Science and Engineering
- Degree:
- Doctor of Philosophy
- Document Type:
- Dissertation
- Date of Defense:
- June 15, 2021
- Committee Members:
- Mauricio Terrones, Outside Field Member
Saptarshi Das, Outside Unit & Field Member
John Mauro, Major Field Member
Todd St.Clair, Special Member
Joshua Robinson, Chair & Dissertation Advisor
John Mauro, Program Head/Chair - Keywords:
- 2D materials
MoS2
molybdenum disulfide
MOCVD
CVD
chemical vapor deposition
metalorganic chemical vapor deposition
electronic and photonic materials
materials synthesis
two-dimensional materials
transition metal dichalcogenides
glass
multicomponent glass
alkali aluminosilicate
alkaline earth boroaluminosilicate
low-temperature CVD
low-temperature synthesis
transparent electronics
flexible electronics - Abstract:
- Two-dimensional (2D) transition metal dichalcogenides (TMDs) have demonstrated promising proof-of-concept performance in electronic and optoelectronic applications. Aside from desirable electronic properties, TMDs also exhibit inherent flexibility and transparency due to their atomically thin nature. Fabrication of TMD-based nanoelectronics directly on transparent, flexible substrates remains a challenge due to the high processing temperatures required for synthesis of highly crystalline material, temperatures which are generally not compatible with industrially relevant multicomponent glasses such as flexible Willow Glass, LCD display Lotus Glass, and the ubiquitous Gorilla Glass. This dissertation addresses the limitations of TMD growth on glass by examining the impact of glass surface chemistry, synthesis parameters, and alkali ion species on the nucleation and growth of MoS2 and WSe¬2 using metalorganic chemical vapor deposition (MOCVD). Chapter 1 introduces the necessary background, overarching hypothesis, technical motivation, and relevant literature on low-temperature CVD, alkali-assisted CVD, and CVD-on-glass of TMDs. Chapter 2 discusses the requisite experimental methods, particularly the synthesis processes and characterization techniques used. Chapter 3 presents the findings regarding initial synthesis optimization of MoS2 and WSe2 as well as alkali-assisted CVD. Chapter 3 also presents findings regarding the effect of glass chemistry on low-temperature CVD of TMDs through use of alkali-containing glass and substrate surface treatment. Chapter 4 introduces a carbon-free H2S precursor to further improve domain size and electronic properties, and examines the benefits of a combined approach involving various alkali-containing glass chemistries, alkali halides, and H2S-based growth. Chapter 5 includes MoS2 synthesis of vertically oriented films for electrochemical catalysis and lateral MoS2-graphene heterostructures. Lastly, Chapter 6 discusses the implications and future work in the growth of device-quality TMDs directly on multicomponent glasses.