1. SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER Open Access Author: Al-Hinai, Ashraf Talib Title: SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER Graduate Program: Materials Science and Engineering Keywords: hydrogen peroxidebare metalhydroxylaminechemical mechanical polishingcmpbtabenzotriazolecopper File: Download ata107phd.pdf Committee Members: Barbara Shaw, Committee MemberHoward W Pickering, Committee MemberKwadwo Osseo Asare, Committee Chair/Co-ChairTarasankar Debroy, Committee Member
