1. Microwave Plasma Chemical Vapor Deposition of Homoepitaxial Diamond for M-i-P Diodes: A Study of Reactor Design, Growth Kinetics, and Surface Morphology Open Access Author: Bresnehan, Michael Stephen Title: Microwave Plasma Chemical Vapor Deposition of Homoepitaxial Diamond for M-i-P Diodes: A Study of Reactor Design, Growth Kinetics, and Surface Morphology Graduate Program: Materials Science and Engineering Keywords: MPCVDDiamondSurface MorphologyGrowth KineticsM-i-P DiodeCVD Diamond File: Download MBresnehan_-_Thesis_Final.pdf Committee Members: Joan Marie Redwing, Thesis Advisor/Co-AdvisorJoan Marie Redwing, Thesis Advisor/Co-AdvisorDavid W Snyder, Thesis Advisor/Co-Advisor
