1. Microwave Plasma Chemical Vapor Deposition of Homoepitaxial Diamond for M-i-P Diodes: A Study of Reactor Design, Growth Kinetics, and Surface Morphology Open Access Author: Bresnehan, Michael Stephen Title: Microwave Plasma Chemical Vapor Deposition of Homoepitaxial Diamond for M-i-P Diodes: A Study of Reactor Design, Growth Kinetics, and Surface Morphology Graduate Program: Materials Science and Engineering Keywords: MPCVDDiamondSurface MorphologyGrowth KineticsM-i-P DiodeCVD Diamond File: Download MBresnehan_-_Thesis_Final.pdf Committee Members: Joan Marie Redwing, Thesis Advisor/Co-AdvisorJoan Marie Redwing, Thesis Advisor/Co-AdvisorDavid W Snyder, Thesis Advisor/Co-Advisor
2. MULT-SCALE MODELLING AND COMPUTATIONAL FLUID DYNAMICS ANALSYIS OF TRANSITION METAL DICHALCOGENIDE (TMD) GROWTH IN AN MOCVD CHAMBER Open Access Author: Zafar, Suhaib Title: MULT-SCALE MODELLING AND COMPUTATIONAL FLUID DYNAMICS ANALSYIS OF TRANSITION METAL DICHALCOGENIDE (TMD) GROWTH IN AN MOCVD CHAMBER Graduate Program: Mechanical Engineering Keywords: CFD2D materialsTMDsMOCVDGrowth Kinetics File: Download MS_thesis_Suhaib.pdf Committee Members: Yuan Xuan, Thesis Advisor/Co-AdvisorRobert Francis Kunz, Committee MemberKaren Ann Thole, Program Head/Chair
