1. EFFECT OF RF SUBSTRATE BIAS ON VANADIUM OXIDE THIN FILMS DURING REACTIVE PULSED DC MAGNETRON SPUTTER DEPOSITION Open Access Author: BASANTANI, Hitesh Arjun Title: EFFECT OF RF SUBSTRATE BIAS ON VANADIUM OXIDE THIN FILMS DURING REACTIVE PULSED DC MAGNETRON SPUTTER DEPOSITION Graduate Program: Engineering Science Keywords: Low NoiseSputteringSubstrate BiasMicrotwinsInfrared ImagingHigh TCRBolometerVanadium Oxide File: Download BasantaniHitesh-Dissertation.pdf Committee Members: Mark William Horn, Thesis Advisor/Co-AdvisorMark William Horn, Thesis Advisor/Co-Advisor
