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Start Over Degree PHD Year 2002 Committee Member Kwadwo Osseo Asare Keyword chemical mechanical polishing Keyword cmp Keyword copper Author Last Name Al-Hinai

1. SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER

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Open Access
Author:
Al-Hinai, Ashraf Talib
Title:
SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER
Graduate Program:
Materials Science and Engineering
Keywords:
hydrogen peroxide
bare metal
hydroxylamine
chemical mechanical polishing
cmp
bta
benzotriazole
copper
File:
Download ata107phd.pdf
Committee Members:
Barbara Shaw, Committee Member
Howard W Pickering, Committee Member
Kwadwo Osseo Asare, Committee Chair/Co-Chair
Tarasankar Debroy, Committee Member

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