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Start Over Degree PHD Year 2002 Committee Member Kwadwo Osseo Asare Committee Member Tarasankar Debroy Keyword bare metal Keyword chemical mechanical polishing Keyword cmp

1. SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER

open_access
Open Access
Author:
Al-Hinai, Ashraf Talib
Title:
SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER
Graduate Program:
Materials Science and Engineering
Keywords:
hydrogen peroxide
bare metal
hydroxylamine
chemical mechanical polishing
cmp
bta
benzotriazole
copper
File:
Download ata107phd.pdf
Committee Members:
Barbara Shaw, Committee Member
Howard W Pickering, Committee Member
Kwadwo Osseo Asare, Committee Chair/Co-Chair
Tarasankar Debroy, Committee Member

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