Search

Start Over Degree PHD Year 2002 Keyword copper Keyword cmp Access Level open_access

1. SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER

open_access
Open Access
Author:
Al-Hinai, Ashraf Talib
Title:
SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER
Graduate Program:
Materials Science and Engineering
Keywords:
hydrogen peroxide
bare metal
hydroxylamine
chemical mechanical polishing
cmp
bta
benzotriazole
copper
File:
Download ata107phd.pdf
Committee Members:
Barbara Shaw, Committee Member
Howard W Pickering, Committee Member
Kwadwo Osseo Asare, Committee Chair/Co-Chair
Tarasankar Debroy, Committee Member