ATOMISTIC-SCALE INVESTIGATION OF THE GROWTH KINETICS OF ALUMINUM OXIDE LAYERS ON ALUMINUM NANOPARTICLES AND GERMANIUM-BASED SEMICONDUCTORS USING THE REAXFF REACTIVE FORCE FIELD
Adri C.T. van Duin, Dissertation Advisor/Co-Advisor Adri C.T. van Duin, Committee Chair/Co-Chair Yuan Xuan, Committee Member Richard A Yetter, Committee Member Roman Engel-Herbert, Outside Member
